Matmeas RMS-1000P High-Temp Four-Point Probe Resistivity System — 1

Overview

RMS-1000P High-Temp Four-Point Probe Resistivity Measurement System is designed for semiconductor thin films and wafer characterization. As an experienced semiconductor test equipment factory, we provide precise sheet resistance and resistivity measurement using dual electrostatic method. The system handles silicon, germanium, GaAs, and ITO films with specialized spring-loaded probe fixture, supporting RT-1000°C testing in vacuum or controlled atmospheres for R&D laboratories and wafer manufacturers.

Specifications

Parameter Value
Measurement Principle In-line four-probe method; dual electrical-measurement combination
Main Measurement Resistivity & sheet resistance
Range 0.1 mΩ–100 MΩ
Max Furnace Temperature Up to 1100°C
Atmosphere Inert/oxidizing/reducing; vacuum; flowing atmosphere
Notable Features One-touch lift; thin-film-friendly probe; professional thin-film software
Temperature Range RT-600°C / 1000°C
Temperature Control Accuracy ±0.5°C
Temperature Control Method PID precision control
Heating Rate 0-10°C/min (typical 3°C/min)
Resistance Range 0.1mΩ ~ 100MΩ
Resistivity Range 1mΩ.cm ~ 10MΩ.cm
Sheet Resistance Range 0.1mΩ ~ 100MΩ
Sample Specification Thin film 15-30mm, d<4mm
Measurement Method Four-point probe dual electrostatic
Electrode Material Tungsten carbide / Platinum probes
Needle Insulation Resistance ≥1000MΩ
Insulation Material 99% alumina ceramic
Display 10.1" color touchscreen
Data Interface USB
Communication Interface LAN port
Data Storage TXT format
Dimensions (L×H×W) 630×640×450mm
Weight 42.5kg
Power Supply 220V±10%, 50Hz, 2.6kW
Standards ASTM F84, GB/T1551-2009, GB/T1551-1995

Applications

  1. RMS-1000P is specialized for semiconductor thin film characterization including silicon wafers, germanium substrates, GaAs, InSb, GaAsAl, GaAsP, solid solution semiconductors, and ITO conductive glass. Critical for solar cell manufacturing, LED production, integrated circuit development, and transparent conductive film research.

More Details

Four-Probe Advantage
Classic in-line probe design helps avoid damage to thin-film samples.
Atmosphere Options
Supports inert/oxidizing/reducing atmospheres, vacuum, and flowing gas for temperature-dependent measurements.

FAQ

  • What is the primary measurement principle of RMS-1000P?

    The RMS-1000P uses the classic in-line four-point probe method combined with a dual-configuration electrical measurement method (forward and reverse current sweeps). By applying a constant current through the outer two probes and measuring the voltage drop across the inner two probes, it effectively eliminates contact resistance and probe wire resistance. The dual-configuration technique mathematically corrects for geometry and boundary errors, ensuring extremely precise and repeatable sheet resistance and resistivity measurements of thin films and semiconductor wafers at high temperatures.

  • What sample shapes and forms are supported?

    The system supports standard sample geometries including solid blocks, circular thin-sheet discs, and rectangular bars with specialized test fixtures.

  • Does RMS-1000P comply with international laboratory standards?

    Yes, all measurements fully align with international norms such as ASTM, IEEE, and GB/T standards to deliver publishable, research-grade data.

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